AXIC is a leading provider of thin film solutions, specializing in low-cost, high-value XRF and Plasma Systems for various applications such as ICP, DRIE, PECVD, and x-ray metrology. With a track record dating back to 1980, AXIC has been serving the needs of semiconductor, production, pilot line, university, and research facilities worldwide. Their systems are widely used for etching and deposition of thin films, plasma surface treatment, plasma cleaning, and x-ray fluorescence measurement of metal films and film stacks.
Offering a wide range of system platforms, including conventional parallel plate RIE, barrel electrodes, and ICP systems, AXIC provides solutions for various etch and deposition applications. Their XRF systems incorporate both energy dispersive and wavelength dispersive technologies, enabling high-resolution measurement of metal film and film stacks thickness and composition. With a focus on precise, reliable, and virtually maintenance-free performance, AXIC is dedicated to meeting specific process requirements and providing comprehensive customer support.
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